Relaxed for a day.

Huang Mingzhe received a report from Ma Zhili on the fourth day of the Chinese New Year, and he hurried over to the Materials Research Institute.

"President, you are finally here." Ma Zhili said excitedly as he walked.

Looking at Ma Zhili and others' bloodshot eyes and hair, they knew that they had been testing the regular models of photosensitive materials these days.

"Old Ma should combine work and rest, let's talk in the office!" Huang Mingzhe went to the office.

"Thank you for your concern, I was just too excited for a moment."

In the office, there were only Ma Zhili and four researchers present, and none of the others came back to work.

"Everyone sits." After Huang Mingzhe sat down, "The material output efficiency calculated by the model is about 8.6%, and the material output pass rate is about 1.7%.

"Yes, President." Ma Zhili said excitedly: "President, the computing model you developed is so amazing, it is simply a magical tool for material research and development."

"Everything in the universe is in mathematics, nothing cannot be calculated." Huang Mingzhe said with a smile.

If someone had said this before in front of Ma Zhili and others, they would have sneered, but now they have believed it a little.

"President, if you send out this model, it will probably trigger a material science revolution." Ma Zhili exclaimed.

Huang Mingzhe shook his head and said, "This international spirit is not enough. We can just use this model internally."

"The president is right."

"I read your report, and now I will give you the next task."

"President, please give me instructions." Ma Zhili quickly took out his notebook and said.

"Develop an x-ray hypersensitive adhesive."

"X-ray high-sensitive adhesive? The president wants to develop photoresist!" Ma Zhili knew Huang Mingzhe's plan as soon as he heard it.

Huang Mingzhe nodded: "That's right, it's the x-ray-level photoresist. I have made several requirements. The wavelength should be between 3 and 8 nanometers; the x-ray sensitivity should be high enough, and it is best to completely dissolve within a few seconds; in addition, for the x-ray energy level, it is best to achieve rapid photodecomposition without high energy levels."

"President, if we develop x-ray photoresist, this one will have no customers." Ma Zhili reminded.

The light sources of lithography machines on the market are generally divided into ultraviolet light (uv), deep ultraviolet light (duv), and extreme ultraviolet light (euv). Among them, the most advanced lithography machine is the extreme ultraviolet light (euv) produced by Asmay, the Netherlands, with a wavelength of 13.4 nanometers.

But in fact, in the 1980s, in addition to the extreme ultraviolet light (euv) route, there was another route - x-ray lithography machine.

Why are x-ray lithography machines with wavelengths below 10 nanometers finally eliminated by extreme ultraviolet light (euv)?

There are two reasons: one is the efficiency problem. The photolithography speed of photoresist is relatively slow under x-ray irradiation; the other is the accuracy problem. Why do x-rays with wavelengths below 10 nanometers have poor photolithography accuracy? Because the mask cannot be less than 10 nanometers.

The mask is the motherboard of the circuit diagram. Why is the accuracy of extreme ultraviolet light (euv) high? The reason is that ultraviolet light can use convex lenses to reduce the light coming from the mask. Everyone knows that the penetration power of x-rays is very strong, and convex lenses cannot focus at all.

So the x-ray lithography machine was eliminated.

There is no x-ray lithography machine on the market, which means there are no customers.

“This question is not a problem.”

"If the president has no customers..."

Huang Mingzhe interrupted Ma Zhili: "Do you know why the x-ray lithography machine was eliminated?"

Ma Zhili nodded.

"The problem with efficiency lies in the photosensitive nature of the photoresist. If we develop an x-ray photoresist that can complete photolithography in a few seconds, is efficiency still a problem?" Huang Mingzhe asked back.

"Hmm?" Ma Zhili was stunned.

Indeed, as Huang Mingzhe said, the problem of lithography efficiency is actually the influence of photosensitiveness of photoresist. In the final analysis, it is a material problem. Isn't the material problem exactly the strength of the thinking society?

"As for convex lenses that cannot focus x-rays, why don't we create a convex lens that can focus x-rays? This is also the photosensitive nature of the convex lens material, and the material can change everything." Huang Mingzhe reminded with a smile.

"Yes! Why didn't I expect it?" Ma Zhili's eyes widened.

Others also suddenly became short of breath. If they solved the photosensitive nature of photoresist and convex lenses, wouldn’t it be equivalent to completing the shortcomings of x-ray lithography machines?

The inherent advantages of x-ray lithography machines are low divergence, concentrated light, and short and concise wavelengths.

"If we want to complete an independent lithography machine system, we cannot follow the old path of Westerners, otherwise we will never be able to surpass the other party." Huang Mingzhe said.

This question is actually a roadblock in the development of the domestic lithography machine industry. Following the Western route, how can other people’s patents be avoided?

In addition, the market for lithography machines is very small, and there are only so many chip manufacturing companies coming and going around the world. Asmay has a close relationship with these chip manufacturing companies. Even if it is made, it probably won’t be sold.

"President, we will arrange material calculations immediately and we will definitely take down the x-ray photoresist and x-ray convex lens." Ma Zhili said firmly.

"Pay attention to rest, the body is the capital of revolution." Huang Mingzhe said with concern.

"Thank you, the president for your concern, I must pay attention."

"Old Ma, you must also pay attention to confidentiality. This thing is related to the right to speak in an industry and cannot be careless." Huang Mingzhe finally reminded.

"I must pay attention." Ma Zhili's face suddenly became sober.

...

Huang Mingzhe then called Cai Zhixing over and told him to prepare the relevant work and acquire companies related to lithography machines in China such as x-ray light source manufacturing companies, optical lens manufacturing companies, etc.

The Computer Programming Institute of Siwei Society has very strong software strength. After all, Huang Mingzhe has independently completed the existence of the ghost of primary artificial intelligence.

Previous simulation space technology and finite element inverse analysis technology can also help with the design of lithography machines.

Although Siweishe cannot buy the extreme ultraviolet light (euv) lithography machine from Asmay, some of the low-end lithography machines from Shanghai Zhong Microelectronics are.

Buy a low-end lithography machine and use finite element inverse analysis to complete the integration of various systems of the lithography machine first, and then upgrade and transform step by step. You don’t need to make the parts you can buy in China, and find ways to make them yourself if you don’t have them in China.

February 16.

Another subsidiary of Siwei Society was quietly established in Shanmei City, named Shenguang Instrument Company, which was established very low-key.

Huang Mingzhe allocated 400 million yuan as initial development funds for his account.

As for the Materials Research Institute, although it is assisted by regular models, the material research and development work is not that easy.

He has also been in the Institute of Materials Research. As the researchers of the Institute resume work one after another, the progress of various work is accelerating.

"Old Ma, if you don't have enough staff, you can tell Manager Cai, let him recruit more people."

"I'll sort it out tonight and set up a list of gaps." Ma Zhili admired Huang Mingzhe so much now.

In addition to the photosensitive material regular model, Huang Mingzhe has completed the elastic material regular model and the capacitive material regular model these days.

These two regular models have many applications for future materials science research.

Needless to say, elastic materials are, in layman's terms, electrical energy storage materials, which are similar to batteries.

After explaining some things, Huang Mingzhe embarked on the way to school.
Chapter completed!